Implement capture point bias. This offsets the capture
points to reduce the amount bad capture locations (i.e.:
inside objects, near walls etc...).
Two new parameters are added:
- Capture Surface Bias: Ensure a minimum distance between
capture points and surrounding geometry. This is expressed as the
relative distance between two capture point. Requires re-bake
to take effect.
- Capture Escape Bias: Moves capture points enclosed inside
objects above the nearest surface. This bias defines how far a
capture point can be moved for escaping the object. This is
expressed as the relative distance between two capture point.
Requires re-bake to take effect.
This is called virtual offset in the reference material.
A quick prepass runs before the baking to offset the samples away
from any surface that could potentially make bad samples.
In order to speedup the process, we create cluster list of surfels
near each irradiance grid point. This allow access to neighboring
surfels that can contribute to the virtual offset which should
never be more than half a cell wide.
Pull Request: https://projects.blender.org/blender/blender/pulls/110355
0dc3318ffd