0dc3318ffd
Implement capture point bias. This offsets the capture points to reduce the amount bad capture locations (i.e.: inside objects, near walls etc...). Two new parameters are added: - Capture Surface Bias: Ensure a minimum distance between capture points and surrounding geometry. This is expressed as the relative distance between two capture point. Requires re-bake to take effect. - Capture Escape Bias: Moves capture points enclosed inside objects above the nearest surface. This bias defines how far a capture point can be moved for escaping the object. This is expressed as the relative distance between two capture point. Requires re-bake to take effect. This is called virtual offset in the reference material. A quick prepass runs before the baking to offset the samples away from any surface that could potentially make bad samples. In order to speedup the process, we create cluster list of surfels near each irradiance grid point. This allow access to neighboring surfels that can contribute to the virtual offset which should never be more than half a cell wide. Pull Request: https://projects.blender.org/blender/blender/pulls/110355
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